Automatic Direct Plasma Cleaning System

(RPD-5)

Applications

The system is perfectly used for cleaning and surface activation prior to semiconductor packaging process such as die bonding, wire bonding, underfill, molding, etc., capable to effectively remove the surface contaminants of organics and oxides from the packaging materials, excellently enhancing the bonding strength and adhesion performance, thus significantly improving the process yield. With automatic substrates or lead frames loading and unloading assembly, the system is featured with fast cleaning cycle and high cleaning uniformity, particularly suitable for highly demanding production where very high performance of cleaning results is mandatory.

Features

  • Enhanced surface treatment
  • Consistent high-uniformity cleaning
  • High throughput (450 strips/h for 5 lanes)
  • Automatic operation with loading/unloading for max 5 lanes
  • Automatic quick conversion of lane width for product changeover
  • Unique air cooling design in chamber bottom
  • Smart operation and detailed display
  • IPC & PLC based control system with touch screen

Specification

Plasma Frequency

13.56MHz
Plasma PowerStandard 600W, (optional 1000W)
Electrode CoolingAir cooling at chamber bottom
LanesStandard 4 lanes (max 5 lanes)
Lane Width30-60mm (5 lanes), 30-80mm (4 lanes), over 80mm (1-3 lanes), automatic quick conversion
UPH 450 strips (for 5 lanes)
Chamber Size (internal)W280mm✕D440mm✕H55mm
Mass Flow ControllersStandard 2, flow rate 100sccm each
Vacuum GaugePirani or capacitance manometer
Vacuum PumpBuilt-in type, ≥50m3/h
Control SystemWindows based touchscreen IPC + PLC control, supporting manual and automatic operation, process recipe program editing/storage/execution, and automatic process data recording and display. Supports MES
Enclosure DimensionW1800mm✕D1080mm✕H1500mm (tower lamp excluded)
WeightApprox. 700kg
Power SupplyAC380V, 3P+N+PE, 50Hz, 4kW

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