High-Throughput Plasma Cleaning System

(RPB-170)

Applications

The system is perfectly used for cleaning and surface activation prior to semiconductor packaging process such as die bonding, wire bonding, underfill, molding, etc., capable to effectively remove the surface contaminants from the packaging materials, excellently enhancing the bonding strength and adhesion performance, thus significantly improving the process yield. The system possesses a large-capacity chamber and advancedly-designed electrodes, combing high-uniformity cleaning and production efficiency.

Features

  • Max 16 magazines loading capacity
  • Advanced electrode design & excellent uniformity
  • Outstanding cleaning result & reliable performance
  • Slim structure with pump built-in
  • Superior vacuum performance with booster pump
  • Intuitive graphical user interface

Specification

Plasma Frequency13.56MHz
Plasma Power1000W
ElectrodesHorizontal or vertical design available
Chamber SizeW580mm✕D580mm✕H530mm (Approx. 170L)
Chamber CapacityMax. 16 magazines
Vacuum PumpPrimary pump plus booster pump, ≥300m3/h
Chamber VacuumBetter than 5Pa
Vacuum GaugePirani or capacitance manometer
Mass Flow ControllersOne as standard (max three optional), flow rate 100sccm
Control SystemWindows based touchscreen IPC + PLC control, supporting manual and automatic operation, process recipe program editing/storage/execution, and automatic process data recording and display. Supports MES
Enclosure DimensionW1000mm✕D1000mm✕H1850mm (tower lamp excluded)
WeightApprox. 600kg
Power Supply380V, 3P+N+PE, 50Hz, 6kW

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