200MM Fully-Auto Vacuum Laminator

(TEAM-100ARF)

Feature

  1. Dry-resist film saves resist solution drastically in the conventional wet resist process.
  2. Cutting film smaller allows the exposed area on a wafer edge part in accordance with the plate electrode.
  3. Laminating film in a vacuum chamber prevents bubbles on the film as well as damages to the wafer.
  4. Film is laminated in the manner of non-tension avoiding any stress.

Specification

Item
TEAM-100ARF
Throughput

Depending on film type and using conditions.
Wafer Size
5″, 6″, 8″
Film Width5″: 150~160mm width; 6″: 180~200mm width; 8″: 225~230mm width
Utilities – Power

AC100V Single phase 50/60Hz 2.0 KVA
Utilities – Air

Pressure 0.5Mpa 100N1/min
Utilities – Vacuum sourse~74 Kpa
Dimensions
D1,190 X W1,490 X H1,660 mm
Weight
600kg

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